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Information Journal Paper

Title

4H-SIC MESFET WITH DARIN-SIDE AND UNDOPED REGION FOR MODIFYING CHARGE DISTRIBUTION AND HIGH POWER APPLICATIONS

Pages

  121-127

Abstract

 In this paper, a novel MESFET with an undoped region (DS-UR) and drain side-double recessed 4H-SiC metal semiconductor field effect transistor (MESFET) is presented. The key idea in this work is to modify the charge concentration and electric field distribution to improving BREAKDOWN VOLTAGE (VBR) and the maximum output power density (Pmax). The CHARGE DISTRIBUTION plays an important role in determining device characteristics. Two-dimensional and two-carrier device simulation demonstrate that the VBR and Pmax are improved about 57% and 50% compared to source side-double recessed 4H-SiC MESFET (SS) structure, respectively which are important for high power applications.

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  • Cite

    APA: Copy

    OROUJI, ALI ASGHAR, ANBAR HEIDARI, AKRAM, & RAMEZANI, ZEINAB. (2016). 4H-SIC MESFET WITH DARIN-SIDE AND UNDOPED REGION FOR MODIFYING CHARGE DISTRIBUTION AND HIGH POWER APPLICATIONS. JOURNAL OF MODELING IN ENGINEERING, 13(43), 121-127. SID. https://sid.ir/paper/173852/en

    Vancouver: Copy

    OROUJI ALI ASGHAR, ANBAR HEIDARI AKRAM, RAMEZANI ZEINAB. 4H-SIC MESFET WITH DARIN-SIDE AND UNDOPED REGION FOR MODIFYING CHARGE DISTRIBUTION AND HIGH POWER APPLICATIONS. JOURNAL OF MODELING IN ENGINEERING[Internet]. 2016;13(43):121-127. Available from: https://sid.ir/paper/173852/en

    IEEE: Copy

    ALI ASGHAR OROUJI, AKRAM ANBAR HEIDARI, and ZEINAB RAMEZANI, “4H-SIC MESFET WITH DARIN-SIDE AND UNDOPED REGION FOR MODIFYING CHARGE DISTRIBUTION AND HIGH POWER APPLICATIONS,” JOURNAL OF MODELING IN ENGINEERING, vol. 13, no. 43, pp. 121–127, 2016, [Online]. Available: https://sid.ir/paper/173852/en

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