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Title

Influence of Co on the Magnetoresistance of Ni-Cu/Cu Multilayers

Pages

  87-96

Abstract

 in this study, Ni-Cu/Cu multilayers from a single sulfate/sulfamate bath using electrodeposition method from two solutions; ultrapure solution (without impurity of Co) and impure solution (with 0. 2% Co) in galvanostat/potentiostat (G/P) mode was prepared at optimized Cu deposition potential. Magnetoresistance (MR) measurements were performed at room temperature for the Ni-Cu/Cu multilayers as a function of (Cu) layer thickness for both ultrapure and impure electrolytes. The magnetoresistance curves represent an Anisotropic magnetoresistance (AMR) for multilayered samples prepared by ultrapure electrolyte and Giant magnetoresistance (GMR) by impure electrolyte, so that the maximum GMR value was obtained for Ni-Cu/Cu multilayer with 3. 0nm/4. 2nm thickness. The X-ray diffraction pattern (XRD) was used for structural analysis of multilayer films. The XRD pattern confirmed the presence of Satellite peaks, indicating the existence of a superlattice structure. The nominal thickness of the multilayers (Λ nominal) was compared with the thickness of the X-ray diffraction pattern (Λ XRD), which was significantly consistent. . The morphology of the samples was performed using scanning electron microscopy (SEM) which implies uniformity of deposition during the layering process. The results showed that with decreasing thickness of nonmagnetic layer (Cu) the coercivity decreased and saturation magnetization increased.

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    APA: Copy

    JAFARI FESHARAKI, M., & JALALI, M.R.. (2019). Influence of Co on the Magnetoresistance of Ni-Cu/Cu Multilayers. NANOSCALE, 6(3 ), 87-96. SID. https://sid.ir/paper/257002/en

    Vancouver: Copy

    JAFARI FESHARAKI M., JALALI M.R.. Influence of Co on the Magnetoresistance of Ni-Cu/Cu Multilayers. NANOSCALE[Internet]. 2019;6(3 ):87-96. Available from: https://sid.ir/paper/257002/en

    IEEE: Copy

    M. JAFARI FESHARAKI, and M.R. JALALI, “Influence of Co on the Magnetoresistance of Ni-Cu/Cu Multilayers,” NANOSCALE, vol. 6, no. 3 , pp. 87–96, 2019, [Online]. Available: https://sid.ir/paper/257002/en

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