مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

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Information Journal Paper

Title

EFFECT OF THICKNESS ON STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ALN FILMS PREPARED USING SINGLE ION BEAM SPUTTERING

Pages

  45-52

Abstract

 Aluminum nitride (ALN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, ALN thin films with different thicknesses were deposited on silicon substrate by single ION BEAM SPUTTERING method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of 50-150 nm was amorphous, while the polycrystalline hexagonal ALN with a rough surface was observed at a thickness of 300 nm. Also, the formation of ALN in amorphous films is identified by Fourier transform infrared (FTIR) spectroscopy. Atomic force microscopy (AFM) study confirms that the surface roughness and average grain size of films increased with film thickness.

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    APA: Copy

    HAJAKBARI, FATEMEH, HOJABRI, ALIREZA, & MOJTAHEDZADEH LARIJANI, MAJID. (2014). EFFECT OF THICKNESS ON STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ALN FILMS PREPARED USING SINGLE ION BEAM SPUTTERING. JOURNAL OF APPLIED CHEMICAL RESEARCH (JACR), 8(3), 45-52. SID. https://sid.ir/paper/322926/en

    Vancouver: Copy

    HAJAKBARI FATEMEH, HOJABRI ALIREZA, MOJTAHEDZADEH LARIJANI MAJID. EFFECT OF THICKNESS ON STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ALN FILMS PREPARED USING SINGLE ION BEAM SPUTTERING. JOURNAL OF APPLIED CHEMICAL RESEARCH (JACR)[Internet]. 2014;8(3):45-52. Available from: https://sid.ir/paper/322926/en

    IEEE: Copy

    FATEMEH HAJAKBARI, ALIREZA HOJABRI, and MAJID MOJTAHEDZADEH LARIJANI, “EFFECT OF THICKNESS ON STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ALN FILMS PREPARED USING SINGLE ION BEAM SPUTTERING,” JOURNAL OF APPLIED CHEMICAL RESEARCH (JACR), vol. 8, no. 3, pp. 45–52, 2014, [Online]. Available: https://sid.ir/paper/322926/en

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