Information Journal Paper
APA:
CopyTSAI, B.K., DEWITT, D.P., & EARLY, E.A.. (2004). EMITTANCE STANDARDS FOR IMPROVED RADIATION THERMOMETRY DURING THERMAL PROCESSING OF SILICON MATERIALS. INTERNATIONAL SYMPOSIUM ON TEMPERATURE AND THERMAL MEASUREMENTS IN INDUSTRY AND SCIENCE, -(9), 0-0. SID. https://sid.ir/paper/601246/en
Vancouver:
CopyTSAI B.K., DEWITT D.P., EARLY E.A.. EMITTANCE STANDARDS FOR IMPROVED RADIATION THERMOMETRY DURING THERMAL PROCESSING OF SILICON MATERIALS. INTERNATIONAL SYMPOSIUM ON TEMPERATURE AND THERMAL MEASUREMENTS IN INDUSTRY AND SCIENCE[Internet]. 2004;-(9):0-0. Available from: https://sid.ir/paper/601246/en
IEEE:
CopyB.K. TSAI, D.P. DEWITT, and E.A. EARLY, “EMITTANCE STANDARDS FOR IMPROVED RADIATION THERMOMETRY DURING THERMAL PROCESSING OF SILICON MATERIALS,” INTERNATIONAL SYMPOSIUM ON TEMPERATURE AND THERMAL MEASUREMENTS IN INDUSTRY AND SCIENCE, vol. -, no. 9, pp. 0–0, 2004, [Online]. Available: https://sid.ir/paper/601246/en