FABRICATING TI2ALN NANOLAMINATE BY DC MAGNETRON SPUTTERING

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HANTEHZADEH M.R.; GOUDARZI S.

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Journal Paper

Paper Information

Journal: JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY) Year:2006 | Volume:16 | Issue:59 (PHYSICS ISSUE) Page(s): 23-28

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Information Journal Paper

Title

FABRICATING TI2ALN NANOLAMINATE BY DC MAGNETRON SPUTTERING

Author(s)

HANTEHZADEH M.R. | GOUDARZI S. | Issue Writer Certificate

Keywords

TI2ALNQ3

DC MAGNETRON SPUTTERINGQ3

NANOLAMINATIONQ3

THIN FILMSQ3

Abstract

We report on the fabrication of Ti2AlN in this article. THIN FILMS of the Mn+1AXn phase ( M: early transition metal; A: A-group element; X: C and/ or N; n=1-3) Ti2AlN were grown on Ti, Si and glass substrate from a Ti and Al compound target with an Ar/N2 gas mixture using DC MAGNETRON SPUTTERING system. X-ray diffraction and atomic force microscopy (AFM) were used to characterize the Ti2AlN (004) structure and morphology of the samples.

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APA: Copy

HANTEHZADEH, M.R., & GOUDARZI, S.. (2006). FABRICATING TI₂ALN NANOLAMINATE BY DC MAGNETRON SPUTTERING. JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY), 16(59 (PHYSICS ISSUE)), 23-28. SID. https://sid.ir/paper/70326/en

Vancouver: Copy

HANTEHZADEH M.R., GOUDARZI S.. FABRICATING TI₂ALN NANOLAMINATE BY DC MAGNETRON SPUTTERING. JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY)[Internet]. 2006;16(59 (PHYSICS ISSUE)):23-28. Available from: https://sid.ir/paper/70326/en

IEEE: Copy

M.R. HANTEHZADEH, and S. GOUDARZI, “FABRICATING TI₂ALN NANOLAMINATE BY DC MAGNETRON SPUTTERING,” JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY), vol. 16, no. 59 (PHYSICS ISSUE), pp. 23–28, 2006, [Online]. Available: https://sid.ir/paper/70326/en

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