Silver films of 80 to 230 nm thicknesses were deposited on glass substrates at 400 K substrate temperature. Their optical properties were measured by spectrophotometery in the spectral range of 185 - 3300 nm. Kramers Kronig method was used for the analysis of the reflectivity curves of silver films to obtain the optical constants of the films. The influence of substrate temperature on the microstructure of thin metallic films [Structure Zone Model (SZM)] is well established (Movchan and Demchishin (1969); Thornton (1975); Savaloni and coworkers (1992, 1995, 2002)), while there have been some works on the influence of film thickness and morphology (Messier (1986), Savaloni (1995), Grovenor (1984)), deposition rate (Savaloni (1992, 1995)) and deposition angle (Savaloni and Bagheri- Najmi (2002)). The Effective Medium Approximation (EMA) analysis was used to establish the relationship between the SZM and EMA predictions. Good agreements between SZM as a function of film thickness and the values of volume fraction of voids obtained from EMA analysis, is achieved. The unusual (anomalous) behavior of the void fraction as a function of wavelength for different deposition conditions, in certain wavelength region is explained, to be due to the roughness value of the film surface, which corresponds to this wavelength region scattering from the surface roughness, and suggestion is given 2 that, this phenomena may be used as a technique for the roughness estimation of surfaces.