STUDY OF IRIDIUM (IR) THIN FILMS DEPOSITED ON TO SIO2 SUBSTRATES

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BEHFOROUZ MOHAMMAD REZA

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Journal: IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING Year:2006 | Volume:1 | Issue:2 Page(s): 67-76

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Information Journal Paper

Title

STUDY OF IRIDIUM (IR) THIN FILMS DEPOSITED ON TO SIO2 SUBSTRATES

Author(s)

BEHFOROUZ MOHAMMAD REZA | Issue Writer Certificate

Keywords

IRIDIUM (IR)Q4

THIN FILMSQ3

DEPOSITQ3

SILICA (SIO2)Q4

Abstract

Very smooth THIN FILMS of iridium were DEPOSITed on super-polished fused silica (SiO2) substrates employing D.C. magnetron sputtering in argon plasma. The influence of DEPOSITion process parameters on film micro-roughness was investigated. In addition, film optical constants were determined by variable angle spectroscopic eilipsometery within a spectrum ranging from vacuum ultraviolet to middle infrared (140mm-35mm). The surface roughness was also measured by atomic force microscopy (AFM).

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APA: Copy

BEHFOROUZ, MOHAMMAD REZA. (2006). STUDY OF IRIDIUM (IR) THIN FILMS DEPOSITED ON TO SIO₂ SUBSTRATES. IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING, 1(2), 67-76. SID. https://sid.ir/paper/121094/en

Vancouver: Copy

BEHFOROUZ MOHAMMAD REZA. STUDY OF IRIDIUM (IR) THIN FILMS DEPOSITED ON TO SIO₂ SUBSTRATES. IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING[Internet]. 2006;1(2):67-76. Available from: https://sid.ir/paper/121094/en

IEEE: Copy

MOHAMMAD REZA BEHFOROUZ, “STUDY OF IRIDIUM (IR) THIN FILMS DEPOSITED ON TO SIO₂ SUBSTRATES,” IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING, vol. 1, no. 2, pp. 67–76, 2006, [Online]. Available: https://sid.ir/paper/121094/en

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