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Information Journal Paper

Title

INVESTIGATION OF PLASMA TREATMENT EFFECT OF N2+O2 MIXTURE PLASMA ON THE PHOTOCATALYTIC PROPERTIES OF TITANIUM DIOXIDE THIN FILMS

Pages

  45-55

Keywords

TIO2Q2

Abstract

 Titanium dioxide thin films with a thickness of 280 nm were deposited using pulsed DC magnetron reactive sputtering,on glass substrates. In order to deposit a Ti source in an Ar+O2 gas mixture was used with a substrate of temperature 2500c.The X-ray diffraction (XRD) showed anatase phases and Topographical surface using atomic force microscopy (AFM) is studied. Then RF plasma system was changed and treatment effect of N2 + O2 mixture plasma on the reduction concentration of methylene blue dye in the presence of TiO2 thin films evaluated. Finally, the color removal rate (R%) and also degradation reaction rate constant (k) is calculated.characterized.

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    APA: Copy

    JAMEYI, MARYAM, HAGHIGHAT ZADEH, AZADEH, & MAZINANI, BABAK. (2017). INVESTIGATION OF PLASMA TREATMENT EFFECT OF N2+O2 MIXTURE PLASMA ON THE PHOTOCATALYTIC PROPERTIES OF TITANIUM DIOXIDE THIN FILMS. CERAMIC SCIENCE & ENGINEERING, 5(4 ), 45-55. SID. https://sid.ir/paper/227870/en

    Vancouver: Copy

    JAMEYI MARYAM, HAGHIGHAT ZADEH AZADEH, MAZINANI BABAK. INVESTIGATION OF PLASMA TREATMENT EFFECT OF N2+O2 MIXTURE PLASMA ON THE PHOTOCATALYTIC PROPERTIES OF TITANIUM DIOXIDE THIN FILMS. CERAMIC SCIENCE & ENGINEERING[Internet]. 2017;5(4 ):45-55. Available from: https://sid.ir/paper/227870/en

    IEEE: Copy

    MARYAM JAMEYI, AZADEH HAGHIGHAT ZADEH, and BABAK MAZINANI, “INVESTIGATION OF PLASMA TREATMENT EFFECT OF N2+O2 MIXTURE PLASMA ON THE PHOTOCATALYTIC PROPERTIES OF TITANIUM DIOXIDE THIN FILMS,” CERAMIC SCIENCE & ENGINEERING, vol. 5, no. 4 , pp. 45–55, 2017, [Online]. Available: https://sid.ir/paper/227870/en

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