ELECTRODEPOSITION OF CO-CU/CU MULTILAYERED FILMS AND THE EFFECT OF GROWTH PARAMETERS ON THEIR STRUCTURES

Q: How can I download an article?

To download an article from SID, first log in to the site, search for the article title, and click on the 'Download Article' option.

Q: How can I download an ISI article?

To download an ISI article on SID, enter the keyword or article title in the search bar, view the relevant results, click on the desired article, and select the 'Download Article' option.

Q: How can I access the SID database?

To access the SID database, visit SID.ir, create an account, and log in to access scientific resources.

Q: Is downloading articles from SID free?

Some articles on SID are available for free, while others require payment. Details are specified on the article's page.

KAZEMINEZHAD I.; ZAKERIN M.

Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Journal Paper

Paper Information

Journal: IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING Year:2011 | Volume:- | Issue:11 Page(s): 67-75

Download Full-Text

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Persian Verion

View:

726

Download:

Cites:

Information Journal Paper

Title

ELECTRODEPOSITION OF CO-CU/CU MULTILAYERED FILMS AND THE EFFECT OF GROWTH PARAMETERS ON THEIR STRUCTURES

Author(s)

KAZEMINEZHAD I. | ZAKERIN M. | Issue Writer Certificate

Keywords

ELECTRODEPOSITIONQ2

CO-CU/CU MULTILAYERQ2

GROWTH PARAMETERSQ3

NANOSTRUCTUREQ2

Abstract

Electrodeposited CO-CU/CU MULTILAYERed films with nano scale bilayer under different GROWTH PARAMETERS such as deposition potential, total thickness, and electrolyte temperature were prepared from a bath of CuSO4 and CoSO4 on Ti polycrystalline with (101), (103), and (001) strong texture substrates. NANOSTRUCTURE and morphology of the deposits were respectively studied using X-ray diffractometer and scanning electron microscope. The XRD results showed that the multilayers have fcc structure with (111) strong texture. It was found that the growth of Cu is columnar and under more negative Co deposition potential their grain size and height of the Cu column tend to be decreased. It was observed that when total thickness increases the effect of lattice mismatch between the film and substrate decreases. Finally, the surface grain size and also concentration of impurity atoms such as S relatively increase with increasing electrolyte temperature.

Cites

No record.

References

No record.

Cite

APA: Copy

KAZEMINEZHAD, I., & ZAKERIN, M.. (2011). ELECTRODEPOSITION OF CO-CU/CU MULTILAYERED FILMS AND THE EFFECT OF GROWTH PARAMETERS ON THEIR STRUCTURES. IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING, -(11), 67-75. SID. https://sid.ir/paper/121002/en

Vancouver: Copy

KAZEMINEZHAD I., ZAKERIN M.. ELECTRODEPOSITION OF CO-CU/CU MULTILAYERED FILMS AND THE EFFECT OF GROWTH PARAMETERS ON THEIR STRUCTURES. IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING[Internet]. 2011;-(11):67-75. Available from: https://sid.ir/paper/121002/en

IEEE: Copy

I. KAZEMINEZHAD, and M. ZAKERIN, “ELECTRODEPOSITION OF CO-CU/CU MULTILAYERED FILMS AND THE EFFECT OF GROWTH PARAMETERS ON THEIR STRUCTURES,” IRANIAN JOURNAL OF SURFACE SCIENCE AND ENGINEERING, vol. -, no. 11, pp. 67–75, 2011, [Online]. Available: https://sid.ir/paper/121002/en

Related Journal Papers