THE USAGE OF RESONANCE OPTICAL ABSORPTION METHOD FOR MEASUREMENT OF CU ATOMS DURING THE PLASMA SPUTTERING DEPOSITION

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NAGHSHARA H.; SOBHANIAN S.; SADEGHI N.

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

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Journal: Iranian Journal of Physics Research Year:2011 | Volume:11 | Issue:1 Page(s): 55-61

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Title

THE USAGE OF RESONANCE OPTICAL ABSORPTION METHOD FOR MEASUREMENT OF CU ATOMS DURING THE PLASMA SPUTTERING DEPOSITION

Author(s)

NAGHSHARA H. | SOBHANIAN S. | SADEGHI N. | Issue Writer Certificate

Keywords

RESONANCE OPTICAL ABSORPTIONQ2

PLASMA SPUTTERINGQ2

Abstract

In this paper, the RESONANCE OPTICAL ABSORPTION method, is used to measure the Cu atoms number density in different power levels of power supply. Atoms are sputtered from a Cu target during plasma magnetron sputtering deposition. For the light source, a commercial Cu hollow cathode lamp is used. For measurement of gas temperature, a small percentage of N2 is added to the gas mixture and the gas temperature is found by optical emission technique.

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APA: Copy

NAGHSHARA, H., SOBHANIAN, S., & SADEGHI, N.. (2011). THE USAGE OF RESONANCE OPTICAL ABSORPTION METHOD FOR MEASUREMENT OF CU ATOMS DURING THE PLASMA SPUTTERING DEPOSITION. IRANIAN JOURNAL OF PHYSICS RESEARCH, 11(1), 55-61. SID. https://sid.ir/paper/1686/en

Vancouver: Copy

NAGHSHARA H., SOBHANIAN S., SADEGHI N.. THE USAGE OF RESONANCE OPTICAL ABSORPTION METHOD FOR MEASUREMENT OF CU ATOMS DURING THE PLASMA SPUTTERING DEPOSITION. IRANIAN JOURNAL OF PHYSICS RESEARCH[Internet]. 2011;11(1):55-61. Available from: https://sid.ir/paper/1686/en

IEEE: Copy

H. NAGHSHARA, S. SOBHANIAN, and N. SADEGHI, “THE USAGE OF RESONANCE OPTICAL ABSORPTION METHOD FOR MEASUREMENT OF CU ATOMS DURING THE PLASMA SPUTTERING DEPOSITION,” IRANIAN JOURNAL OF PHYSICS RESEARCH, vol. 11, no. 1, pp. 55–61, 2011, [Online]. Available: https://sid.ir/paper/1686/en

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