INVESTIGATION OF CHEMICAL REMOVAL OF LEAD CONTAMINATION FROM SILICON AND CHROMIUM INDUSTRIAL SURFACES BY USING A NOVEL CLEANING SLOUTION

Q: How can I download an article?

To download an article from SID, first log in to the site, search for the article title, and click on the 'Download Article' option.

Q: How can I download an ISI article?

To download an ISI article on SID, enter the keyword or article title in the search bar, view the relevant results, click on the desired article, and select the 'Download Article' option.

Q: How can I access the SID database?

To access the SID database, visit SID.ir, create an account, and log in to access scientific resources.

Q: Is downloading articles from SID free?

Some articles on SID are available for free, while others require payment. Details are specified on the article's page.

KHOSRAVI M.; TALEBI S.

Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Journal Paper

Paper Information

Journal: Journal of Applied Research in Chemistry Year:2013 | Volume:7 | Issue:1 Page(s): 47-54

Download Full-Text

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Persian Verion

View:

736

Download:

Cites:

Information Journal Paper

Title

INVESTIGATION OF CHEMICAL REMOVAL OF LEAD CONTAMINATION FROM SILICON AND CHROMIUM INDUSTRIAL SURFACES BY USING A NOVEL CLEANING SLOUTION

Author(s)

KHOSRAVI M. | TALEBI S. | Issue Writer Certificate

Keywords

RE-ABSORPTIONQ2

CHELATING AGENTQ2

EDTA DISODIUM SALTQ2

SCANNING ELECTRON MICROSCOPY (SEM)Q1

Abstract

In this study, in order to remove the lead contamination from silicon and chromium industrial surfaces, a novel cleaning solution containing hydrogen peroxide (as oxidizing agent) and EDTA DISODIUM SALT (as CHELATING AGENT) was used. After the removal of lead contamination, the UV spectra of the cleaning solutions were examined. The results showed that the prepared Pb (EDTA) complex in the solution can play an important role in the prevention of lead RE-ABSORPTION on the surface of the basic metals in industrial surfaces. Scanning electron microscopy (SEM) study illustrated that by using the suggested solution at optimized condition, the lead contamination can be removed properly with no damage to the surface of the basic metals.

Cites

No record.

References

No record.

Cite

APA: Copy

KHOSRAVI, M., & TALEBI, S.. (2013). INVESTIGATION OF CHEMICAL REMOVAL OF LEAD CONTAMINATION FROM SILICON AND CHROMIUM INDUSTRIAL SURFACES BY USING A NOVEL CLEANING SLOUTION. JOURNAL OF APPLIED RESEARCHES IN CHEMISTRY (JARC), 7(1), 47-54. SID. https://sid.ir/paper/180188/en

Vancouver: Copy

KHOSRAVI M., TALEBI S.. INVESTIGATION OF CHEMICAL REMOVAL OF LEAD CONTAMINATION FROM SILICON AND CHROMIUM INDUSTRIAL SURFACES BY USING A NOVEL CLEANING SLOUTION. JOURNAL OF APPLIED RESEARCHES IN CHEMISTRY (JARC)[Internet]. 2013;7(1):47-54. Available from: https://sid.ir/paper/180188/en

IEEE: Copy

M. KHOSRAVI, and S. TALEBI, “INVESTIGATION OF CHEMICAL REMOVAL OF LEAD CONTAMINATION FROM SILICON AND CHROMIUM INDUSTRIAL SURFACES BY USING A NOVEL CLEANING SLOUTION,” JOURNAL OF APPLIED RESEARCHES IN CHEMISTRY (JARC), vol. 7, no. 1, pp. 47–54, 2013, [Online]. Available: https://sid.ir/paper/180188/en

Related Journal Papers