EFFECT OF THICKNESS ON PROPERTIES OF COPPER THIN FILMS GROWTH ON GLASS BY DC PLANAR MAGNETRON SPUTTERING

Q: How can I download an article?

To download an article from SID, first log in to the site, search for the article title, and click on the 'Download Article' option.

Q: How can I download an ISI article?

To download an ISI article on SID, enter the keyword or article title in the search bar, view the relevant results, click on the desired article, and select the 'Download Article' option.

Q: How can I access the SID database?

To access the SID database, visit SID.ir, create an account, and log in to access scientific resources.

Q: Is downloading articles from SID free?

Some articles on SID are available for free, while others require payment. Details are specified on the article's page.

HOJABRI A.; HAJAKBARI F.; MOGHRI MOAZZEN M.A.; KADKHODAEI S.

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Journal Paper

Paper Information

Journal: JOURNAL OF NANOSTRUCTURES Year:2012 | Volume:2 | Issue:1 Page(s): 107-112

Download Full-Text

Persian Verion

View:

561

Download:

152

Cites:

Information Journal Paper

Title

EFFECT OF THICKNESS ON PROPERTIES OF COPPER THIN FILMS GROWTH ON GLASS BY DC PLANAR MAGNETRON SPUTTERING

Author(s)

HOJABRI A. | HAJAKBARI F. | MOGHRI MOAZZEN M.A. | KADKHODAEI S. | Issue Writer Certificate

Keywords

COPPER THIN FILMQ2

NANOSCALEQ2

THICKNESSQ2

MORPHOLOGYQ2

RESISTIVITYQ2

Abstract

COPPER THIN FILMs with nano-scale structure have numerous applications in modern technology. In this work, Cu thin films with different THICKNESSes from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The THICKNESS effect on the structural, morphological and electrical properties were studied by X-ray diffraction (XRD), atomic force microscope (AFM) and four point probe (FPP) measurements, respectively. The results show that by increasing THICKNESS, the copper films crystallinity in (111) direction increases. Also by varying the films THICKNESS the significant changes were observed in the films surface MORPHOLOGY due to the mechanism of films growth. Finally, the relationship between film RESISTIVITY and Cu film THICKNESS are investigated in this paper.

Cites

No record.

References

No record.

Cite

APA: Copy

HOJABRI, A., HAJAKBARI, F., MOGHRI MOAZZEN, M.A., & KADKHODAEI, S.. (2012). EFFECT OF THICKNESS ON PROPERTIES OF COPPER THIN FILMS GROWTH ON GLASS BY DC PLANAR MAGNETRON SPUTTERING. JOURNAL OF NANOSTRUCTURES, 2(1), 107-112. SID. https://sid.ir/paper/210959/en

Vancouver: Copy

HOJABRI A., HAJAKBARI F., MOGHRI MOAZZEN M.A., KADKHODAEI S.. EFFECT OF THICKNESS ON PROPERTIES OF COPPER THIN FILMS GROWTH ON GLASS BY DC PLANAR MAGNETRON SPUTTERING. JOURNAL OF NANOSTRUCTURES[Internet]. 2012;2(1):107-112. Available from: https://sid.ir/paper/210959/en

IEEE: Copy

A. HOJABRI, F. HAJAKBARI, M.A. MOGHRI MOAZZEN, and S. KADKHODAEI, “EFFECT OF THICKNESS ON PROPERTIES OF COPPER THIN FILMS GROWTH ON GLASS BY DC PLANAR MAGNETRON SPUTTERING,” JOURNAL OF NANOSTRUCTURES, vol. 2, no. 1, pp. 107–112, 2012, [Online]. Available: https://sid.ir/paper/210959/en

Related Journal Papers