Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition

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Rashidi Mahshid; TAMIZIFAR MORTEZA; Boutorabi Seyyed Mohammad Ali

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Journal: JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES Year:2020 | Volume:9 | Issue:1 Page(s): 19-31

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Title

Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition

Author(s)

Rashidi Mahshid | TAMIZIFAR MORTEZA | Boutorabi Seyyed Mohammad Ali | Issue Writer Certificate

Keywords

CoatingQ1

NanostructureQ1

TiAlCNQ2

PACVDQ2

Abstract

In this study, titanium aluminium carbonitride (TiAlCN) ceramic Coatings with different amount of Al were deposited at 350 ° C on H13 hot work tool steel substrates, using pulsed-DC plasma assisted chemical vapor deposition method. Energy-dispersive X-ray spectroscopy (EDS), Fourier-transform infrared spectroscopy (FTIR), glancing incidence X-ray diffraction method (GIXRD), transmission electron microscopy (TEM), Raman spectroscopy, field emission scanning electron microscopy (FE-SEM) and SEM and atomic force microscopy (AFM) were applied for characterizing of the Coatings. Microhardness test utilized for evaluating of microhardness of the Coatings. The Coatings showed a Nanostructure consisted of fcc-TiAlN and hcp-AlN nanocrystalline grains and an amorphous carbon phase. Increasing the amount of Al from ~10 to ~42 at. % led to a decrease of the surface roughness of the Coating from 151± 49 to 88± 27 nm, due to the creation of more nuclei of AlN. Coating with the less amount of Al (~10 at. %) presented the highest microhardness of about 3840 HV0. 01, due to the less amount of chloride impurity and hcp-AlN phase.

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APA: Copy

Rashidi, Mahshid, TAMIZIFAR, MORTEZA, & Boutorabi, Seyyed Mohammad Ali. (2020). Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition. JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES, 9(1 ), 19-31. SID. https://sid.ir/paper/252437/en

Vancouver: Copy

Rashidi Mahshid, TAMIZIFAR MORTEZA, Boutorabi Seyyed Mohammad Ali. Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition. JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES[Internet]. 2020;9(1 ):19-31. Available from: https://sid.ir/paper/252437/en

IEEE: Copy

Mahshid Rashidi, MORTEZA TAMIZIFAR, and Seyyed Mohammad Ali Boutorabi, “Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition,” JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES, vol. 9, no. 1 , pp. 19–31, 2020, [Online]. Available: https://sid.ir/paper/252437/en

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