مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

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Information Journal Paper

Title

SI/SI, SI/SIO2 AND SIO2/SIO2 FUSION WAFER BONDING

Pages

  477-480

Keywords

Not Registered.

Abstract

 The wafer bonding process has many applications in the fabrication of microelectronic, optoelectronic, power and microinachined devices. In this article fusion bonding of silicon, wafers and study of their interface are reported for the first time in Iran. Also, the bonding of two silicon wafers, with one (or both) of the wafers having a thermally grown silicon dioxide layer, has been performed and tested.

Cites

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  • References

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  • Cite

    APA: Copy

    MOTIEI FAR, A., & RASHIDIAN, B.. (2003). SI/SI, SI/SIO2 AND SIO2/SIO2 FUSION WAFER BONDING. SCIENTIA IRANICA, 10(4), 477-480. SID. https://sid.ir/paper/289517/en

    Vancouver: Copy

    MOTIEI FAR A., RASHIDIAN B.. SI/SI, SI/SIO2 AND SIO2/SIO2 FUSION WAFER BONDING. SCIENTIA IRANICA[Internet]. 2003;10(4):477-480. Available from: https://sid.ir/paper/289517/en

    IEEE: Copy

    A. MOTIEI FAR, and B. RASHIDIAN, “SI/SI, SI/SIO2 AND SIO2/SIO2 FUSION WAFER BONDING,” SCIENTIA IRANICA, vol. 10, no. 4, pp. 477–480, 2003, [Online]. Available: https://sid.ir/paper/289517/en

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