مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

video

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

sound

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Persian Version

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

View:

312
مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Download:

149
مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Cites:

Information Journal Paper

Title

CROSSTALK ENHANCEMENT IN 32 NM FD SOI MOSFET USING HR SUBSTRATE AND MULTILAYER BOX

Pages

  38-43

Abstract

 In this paper, the CROSSTALK in 32 nm UTB SOI MOSFET is examined by using a new structure, a HIGH RESISTIVITY SUBSTRATE, and a multilayer BOX (SiO2-Diamond). The electrical and thermal characteristics of the conventional SOI and a multilayer BOX SOI are compared, and it is concluded that PARASITIC CAPACITANCEs and CROSSTALK are improved by incorporating multilayer BOX to a HR Substrate. In a conventional HR FD SOI, CROSSTALK is approximately -121dB, while by incorporating multilayer BOX substrate and increasing the thickness of the DIAMOND to 100nm, CROSSTALK can be reduced by 20%.

Cites

  • No record.
  • References

  • No record.
  • Cite

    APA: Copy

    TAVANAZADEH, PARISA, DAGHIGHI, ARASH, & MAHDAVI NASAB, HOMAYOUN. (2011). CROSSTALK ENHANCEMENT IN 32 NM FD SOI MOSFET USING HR SUBSTRATE AND MULTILAYER BOX. MAJLESI JOURNAL OF ELECTRICAL ENGINEERING, 5(2 (17)), 38-43. SID. https://sid.ir/paper/627022/en

    Vancouver: Copy

    TAVANAZADEH PARISA, DAGHIGHI ARASH, MAHDAVI NASAB HOMAYOUN. CROSSTALK ENHANCEMENT IN 32 NM FD SOI MOSFET USING HR SUBSTRATE AND MULTILAYER BOX. MAJLESI JOURNAL OF ELECTRICAL ENGINEERING[Internet]. 2011;5(2 (17)):38-43. Available from: https://sid.ir/paper/627022/en

    IEEE: Copy

    PARISA TAVANAZADEH, ARASH DAGHIGHI, and HOMAYOUN MAHDAVI NASAB, “CROSSTALK ENHANCEMENT IN 32 NM FD SOI MOSFET USING HR SUBSTRATE AND MULTILAYER BOX,” MAJLESI JOURNAL OF ELECTRICAL ENGINEERING, vol. 5, no. 2 (17), pp. 38–43, 2011, [Online]. Available: https://sid.ir/paper/627022/en

    Related Journal Papers

  • No record.
  • Related Seminar Papers

  • No record.
  • Related Plans

  • No record.
  • Recommended Workshops






    Move to top
    telegram sharing button
    whatsapp sharing button
    linkedin sharing button
    twitter sharing button
    email sharing button
    email sharing button
    email sharing button
    sharethis sharing button