CHEMICAL VAPOR DEPOSITION OF METHANE IN THE PRESENCE OF CU/SI NANOPARTICLES AS A FACILE METHOD FOR GRAPHENE PRODUCTION

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ALLAEDINI G.; AMINAYI P.; TASIRIN S.M.

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Journal Paper

Paper Information

Journal: FULLERENES, NANOTUBES AND CARBON NANOSTRUCTURES Year:2015 | Volume:23 | Issue:11 Page(s): 968-973

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Information Journal Paper

Title

CHEMICAL VAPOR DEPOSITION OF METHANE IN THE PRESENCE OF CU/SI NANOPARTICLES AS A FACILE METHOD FOR GRAPHENE PRODUCTION

Author(s)

ALLAEDINI G. | AMINAYI P. | TASIRIN S.M. | Issue Writer Certificate

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Abstract

Cites

CARBON NANOTUBES VIA DIFFERENT CATALYSTS AND THE IMPORTANT FACTORS THAT AFFECT THEIR PRODUCTION: A REVIEW ON CATALYST PREFERENCES
INVESTIGATIONS ON THE STRUCTURAL, ELECTRICAL PROPERTIES AND CONDUCTION MECHANISM OF CUO NANOFLAKES

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APA: Copy

ALLAEDINI, G., AMINAYI, P., & TASIRIN, S.M.. (2015). CHEMICAL VAPOR DEPOSITION OF METHANE IN THE PRESENCE OF CU/SI NANOPARTICLES AS A FACILE METHOD FOR GRAPHENE PRODUCTION. FULLERENES, NANOTUBES AND CARBON NANOSTRUCTURES, 23(11), 968-973. SID. https://sid.ir/paper/687845/en

Vancouver: Copy

ALLAEDINI G., AMINAYI P., TASIRIN S.M.. CHEMICAL VAPOR DEPOSITION OF METHANE IN THE PRESENCE OF CU/SI NANOPARTICLES AS A FACILE METHOD FOR GRAPHENE PRODUCTION. FULLERENES, NANOTUBES AND CARBON NANOSTRUCTURES[Internet]. 2015;23(11):968-973. Available from: https://sid.ir/paper/687845/en

IEEE: Copy

G. ALLAEDINI, P. AMINAYI, and S.M. TASIRIN, “CHEMICAL VAPOR DEPOSITION OF METHANE IN THE PRESENCE OF CU/SI NANOPARTICLES AS A FACILE METHOD FOR GRAPHENE PRODUCTION,” FULLERENES, NANOTUBES AND CARBON NANOSTRUCTURES, vol. 23, no. 11, pp. 968–973, 2015, [Online]. Available: https://sid.ir/paper/687845/en

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