DESIGNEE, FABRICATION AND APPLICATION OF HFCVD IN GROWTH OF NANOSTRUCTURES

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GHORANNEVIS M.; MOJTAHEDZADEH LARIJANI M.; ESHGHABADI M.; SHOKOUHI ALI; ALIZADEH P.; NASIRI S.

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Journal Paper

Paper Information

Journal: JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY) Year:2008 | Volume:18 | Issue:67 (PHYSIC ISSUE) Page(s): 11-18

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Information Journal Paper

Title

DESIGNEE, FABRICATION AND APPLICATION OF HFCVD IN GROWTH OF NANOSTRUCTURES

Author(s)

Keywords

HFCVDQ3

DESIGNEQ3

FABRICATIONQ3

CARBONQ3

CARBON NANOTUBESQ3

SILICON WAFERQ3

ACETYLENE GASQ3

Abstract

Hot fiament chemical vapor deposition (HFCVD) is a method for deposition technique in nano scale. Electrical, triblogical properties of material can be changed by operation in HFCVD method. HFCVD is suitable method for growth of diamond like CARBON (DLC), CARBON nanotubes and other CARBON nanostructures.

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APA: Copy

GHORANNEVIS, M., MOJTAHEDZADEH LARIJANI, M., ESHGHABADI, M., SHOKOUHI, ALI, ALIZADEH, P., & NASIRI, S.. (2008). DESIGNEE, FABRICATION AND APPLICATION OF HFCVD IN GROWTH OF NANOSTRUCTURES. JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY), 18(67 (PHYSIC ISSUE)), 11-18. SID. https://sid.ir/paper/70250/en

Vancouver: Copy

GHORANNEVIS M., MOJTAHEDZADEH LARIJANI M., ESHGHABADI M., SHOKOUHI ALI, ALIZADEH P., NASIRI S.. DESIGNEE, FABRICATION AND APPLICATION OF HFCVD IN GROWTH OF NANOSTRUCTURES. JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY)[Internet]. 2008;18(67 (PHYSIC ISSUE)):11-18. Available from: https://sid.ir/paper/70250/en

IEEE: Copy

M. GHORANNEVIS, M. MOJTAHEDZADEH LARIJANI, M. ESHGHABADI, ALI SHOKOUHI, P. ALIZADEH, and S. NASIRI, “DESIGNEE, FABRICATION AND APPLICATION OF HFCVD IN GROWTH OF NANOSTRUCTURES,” JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY), vol. 18, no. 67 (PHYSIC ISSUE), pp. 11–18, 2008, [Online]. Available: https://sid.ir/paper/70250/en

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