Information Journal Paper
APA:
CopyShakouri, R., & Haydary, H.. (2017). Investigation of SiO2 thin film uniformity deposited by electron beam and thermal evaporation method. IRANIAN JOURNAL OF PHYSICS RESEARCH, 17(4 ), 621-628. SID. https://sid.ir/paper/2032/en
Vancouver:
CopyShakouri R., Haydary H.. Investigation of SiO2 thin film uniformity deposited by electron beam and thermal evaporation method. IRANIAN JOURNAL OF PHYSICS RESEARCH[Internet]. 2017;17(4 ):621-628. Available from: https://sid.ir/paper/2032/en
IEEE:
CopyR. Shakouri, and H. Haydary, “Investigation of SiO2 thin film uniformity deposited by electron beam and thermal evaporation method,” IRANIAN JOURNAL OF PHYSICS RESEARCH, vol. 17, no. 4 , pp. 621–628, 2017, [Online]. Available: https://sid.ir/paper/2032/en