SPECTROSCOPIC-ELLIPSOMETRIC STUDY OF NATIVE OXIDE REMOVAL BY LIQUID PHASE HF PROCESS

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KURHEKAR ANIL SUDHAKAR; APTE PRAKASH R.

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Journal Paper

Paper Information

Journal: INTERNATIONAL NANO LETTERS (INL) Year:2013 | Volume:3 | Issue:3 Page(s): 1-9

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Title

SPECTROSCOPIC-ELLIPSOMETRIC STUDY OF NATIVE OXIDE REMOVAL BY LIQUID PHASE HF PROCESS

Author(s)

KURHEKAR ANIL SUDHAKAR | APTE PRAKASH R. | Issue Writer Certificate

Keywords

SILICON<100>

SPECTROSCOPY

ELLIPSOMETRY

NATIVE OXIDE REMOVAL

FTIR

CLEAVAGE

MEMS

Abstract

Ex situ spectroscopic ELLIPSOMETRY (SE) measurements have been employed to investigate the effect of liquid-phase hydrofluoric acid (HF) cleaning on Si<100>surfaces for microelectromechanical systems application. The hydrogen terminated (H-terminated) Si surface was realized as an equivalent dielectric layer, and SE measurements are performed. The SE analyses indicate that after a 20-s 100: 5 HF dip with rinse, the Si (100) surface was passivated by the hydrogen termination and remained chemically stable. Roughness of the HF-etched bare Si (100) surface was observed and analyzed by the ex-situ SE. Evidence for desorption of the H-terminated Si surface layer is studied using Fourier transform infrared SPECTROSCOPY and ELLIPSOMETRY, and discussed. This piece of work explains the usage of an ex situ, non-destructive technique capable of showing state of passivation, the H-termination of Si<100>surfaces.

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References

GEOMETRICAL PARAMETERS MEASUREMENT OF SURFACE FUNCTIONALIZED MICROMACHINED MICRO-CANTILEVER USING OPTICAL METHOD

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APA: Copy

KURHEKAR, ANIL SUDHAKAR, & APTE, PRAKASH R.. (2013). SPECTROSCOPIC-ELLIPSOMETRIC STUDY OF NATIVE OXIDE REMOVAL BY LIQUID PHASE HF PROCESS. INTERNATIONAL NANO LETTERS (INL), 3(3), 1-9. SID. https://sid.ir/paper/321349/en

Vancouver: Copy

KURHEKAR ANIL SUDHAKAR, APTE PRAKASH R.. SPECTROSCOPIC-ELLIPSOMETRIC STUDY OF NATIVE OXIDE REMOVAL BY LIQUID PHASE HF PROCESS. INTERNATIONAL NANO LETTERS (INL)[Internet]. 2013;3(3):1-9. Available from: https://sid.ir/paper/321349/en

IEEE: Copy

ANIL SUDHAKAR KURHEKAR, and PRAKASH R. APTE, “SPECTROSCOPIC-ELLIPSOMETRIC STUDY OF NATIVE OXIDE REMOVAL BY LIQUID PHASE HF PROCESS,” INTERNATIONAL NANO LETTERS (INL), vol. 3, no. 3, pp. 1–9, 2013, [Online]. Available: https://sid.ir/paper/321349/en

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