INFLUENCE OF ANNEALING TEMPERATURE ON THE PROPERTIES OF ITO FILMS PREPARED BY ELECTRON BEAM EVAPORATION AND ION-ASSISTED DEPOSITION

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POKAIPISIT A.; HORPRATHUM M.; LIMSUWAN P.

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Journal Paper

Paper Information

Journal: KASETSART JOURNAL: NATURAL SCIENCE Year:2008 | Volume:42 | Issue:- Page(s): 362-366

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Information Journal Paper

Title

INFLUENCE OF ANNEALING TEMPERATURE ON THE PROPERTIES OF ITO FILMS PREPARED BY ELECTRON BEAM EVAPORATION AND ION-ASSISTED DEPOSITION

Author(s)

POKAIPISIT A. | HORPRATHUM M. | LIMSUWAN P. | Issue Writer Certificate

Keywords

Not Registered.

Abstract

Cites

THE EFFECT OF VARYING TEMPERATURE AND O2 FLOW RATE IN EX SITU ANNEALED TIN-DOPED INDIUM FOR FABRICATION OF COMMERCIAL GRADE INDIUM TIN OXIDE

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APA: Copy

POKAIPISIT, A., HORPRATHUM, M., & LIMSUWAN, P.. (2008). INFLUENCE OF ANNEALING TEMPERATURE ON THE PROPERTIES OF ITO FILMS PREPARED BY ELECTRON BEAM EVAPORATION AND ION-ASSISTED DEPOSITION. KASETSART JOURNAL: NATURAL SCIENCE, 42(-), 362-366. SID. https://sid.ir/paper/638990/en

Vancouver: Copy

POKAIPISIT A., HORPRATHUM M., LIMSUWAN P.. INFLUENCE OF ANNEALING TEMPERATURE ON THE PROPERTIES OF ITO FILMS PREPARED BY ELECTRON BEAM EVAPORATION AND ION-ASSISTED DEPOSITION. KASETSART JOURNAL: NATURAL SCIENCE[Internet]. 2008;42(-):362-366. Available from: https://sid.ir/paper/638990/en

IEEE: Copy

A. POKAIPISIT, M. HORPRATHUM, and P. LIMSUWAN, “INFLUENCE OF ANNEALING TEMPERATURE ON THE PROPERTIES OF ITO FILMS PREPARED BY ELECTRON BEAM EVAPORATION AND ION-ASSISTED DEPOSITION,” KASETSART JOURNAL: NATURAL SCIENCE, vol. 42, no. -, pp. 362–366, 2008, [Online]. Available: https://sid.ir/paper/638990/en

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