VACUUM DEPOSITION OF METAL-OXIDE THIN FILMS ON SILICA SUBSTRATES BY PHYSICAL EVAPORATION

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HOSSEINI GOLGOO SEYED MOHSEN; SHOKOUHMAND EHSAN; AFZALZADEH REZA; HOSSEIN BABAEI FARAMARZ

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Seminar Paper

Paper Information

Seminar: NATIONAL VACUUM CONFERENCE IRAN
Year:2008 | Issue:3

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Title

VACUUM DEPOSITION OF METAL-OXIDE THIN FILMS ON SILICA SUBSTRATES BY PHYSICAL EVAPORATION

Author(s)

HOSSEINI GOLGOO SEYED MOHSEN | SHOKOUHMAND EHSAN | AFZALZADEH REZA | HOSSEIN BABAEI FARAMARZ

Keywords

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Abstract

THIN LAYERS OF TIN OXIDE AND ZINC OXIDE WERE DEPOSITED ON SILICA SUBSTRATES BY PHYSICAL VAPOR DEPOSITION IN A VACUUM CHAMBER USING ELECTRON BEAM HEATING. THE CHAMBER PRESSURE WAS~10-5 TORR AND THE SUBSTRATES WERE AT ROOM TEMPERATURE. THE DEPOSITED TIN OXIDE LAYERS WERE ELECTRICALLY INSULATING AND WERE PROVED TO BE AMORPHOUS. THESE LAYERS WERE CRYSTALLIZED IN CONTROLLED ATMOSPHERES AT DIFFERENT TEMPERATURES. THE CRYSTALLIZED LAYERS WERE SNO2. THE KINETICS OF THE CRYSTALLIZATION PROCESS IN DIFFERENT CONDITIONS WAS INVESTIGATED. THE APPLICATION OF A SIMILAR TECHNIQUE TO ZINC OXIDE, ON THE OTHER HAND, PROVED UNSUCCESSFUL AS IT RESULTED BLACK CONDUCTIVE LAYERS WEAKLY ADHERING TO THE SUBSTRATE SURFACE.

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APA: Copy

HOSSEINI GOLGOO, SEYED MOHSEN, SHOKOUHMAND, EHSAN, AFZALZADEH, REZA, & HOSSEIN BABAEI, FARAMARZ. (2008). VACUUM DEPOSITION OF METAL-OXIDE THIN FILMS ON SILICA SUBSTRATES BY PHYSICAL EVAPORATION. NATIONAL VACUUM CONFERENCE IRAN. SID. https://sid.ir/paper/905398/en

Vancouver: Copy

HOSSEINI GOLGOO SEYED MOHSEN, SHOKOUHMAND EHSAN, AFZALZADEH REZA, HOSSEIN BABAEI FARAMARZ. VACUUM DEPOSITION OF METAL-OXIDE THIN FILMS ON SILICA SUBSTRATES BY PHYSICAL EVAPORATION. 2008. Available from: https://sid.ir/paper/905398/en

IEEE: Copy

SEYED MOHSEN HOSSEINI GOLGOO, EHSAN SHOKOUHMAND, REZA AFZALZADEH, and FARAMARZ HOSSEIN BABAEI, “VACUUM DEPOSITION OF METAL-OXIDE THIN FILMS ON SILICA SUBSTRATES BY PHYSICAL EVAPORATION,” presented at the NATIONAL VACUUM CONFERENCE IRAN. 2008, [Online]. Available: https://sid.ir/paper/905398/en

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