EFFECT OF CHAMBER PRESSURE ON THE GROWTH OF NANOPARTICLES COPPERCARBON COMPOSITE FILMS PREPARED BY SIMULTANEOUS USE OF RFPECVD AND RF-SPUTTERING DEPOSITION TECHNIQUE

Q: How can I download an article?

To download an article from SID, first log in to the site, search for the article title, and click on the 'Download Article' option.

Q: How can I download an ISI article?

To download an ISI article on SID, enter the keyword or article title in the search bar, view the relevant results, click on the desired article, and select the 'Download Article' option.

Q: How can I access the SID database?

To access the SID database, visit SID.ir, create an account, and log in to access scientific resources.

Q: Is downloading articles from SID free?

Some articles on SID are available for free, while others require payment. Details are specified on the article's page.

GHODS ELAHI TAYEBEH; VESAGHI mohamad ali; SHAFIEKHANI AZIZOLLAH; OLIAIY PARVIN; LAMEII RASHTI MOHAMAD

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Seminar Paper

Paper Information

Seminar: NATIONAL VACUUM CONFERENCE IRAN
Year:2008 | Issue:3

Download Full-Text

View:

154

Download:

Information Seminar Paper

Title

EFFECT OF CHAMBER PRESSURE ON THE GROWTH OF NANOPARTICLES COPPERCARBON COMPOSITE FILMS PREPARED BY SIMULTANEOUS USE OF RFPECVD AND RF-SPUTTERING DEPOSITION TECHNIQUE

Author(s)

GHODS ELAHI TAYEBEH | VESAGHI mohamad ali | SHAFIEKHANI AZIZOLLAH | OLIAIY PARVIN | LAMEII RASHTI MOHAMAD

Keywords

Not Registered.

Abstract

NANOPARTICLE COPPER/CARBON COMPOSITE FILMS WERE PREPARED BY CO-DEPOSITION OF RF-SPUTTERING AND RF-PECVD METHOD FROM ACETYLENE GAS AND COPPER TARGET. WE INVESTIGATE DEPOSITION PROCESS IN THE REGION WHERE BY CHANGING PRESSURE, THE PROCESS CONVERTS TO PHYSICAL SPUTTERING MODE IN CONSTANT POWER REGIME AND AT A CRITICAL PRESSURE BETWEEN 1.5 TO 3 PA. THE ESTIMATED VALUE OF MEAN ION ENERGY AT THIS CRITICAL POINT OF PRESSURE IS CLOSE TO THRESHOLD ENERGY OF PHYSICAL SPUTTERING OF COPPER ATOMS BY ACETYLENE IONS. BY UTILIZING THIS PROPERTY AND BY SETTING INITIAL PRESSURE FROM 1.3 TO 6.6 PA, NANOPARTICLES COPPER/CARBON COMPOSITE FILMS WERE GROWN WITH DIFFERENT COPPER CONTENT. THE COPPER CONTENT OF OUR FILMS WAS OBTAINED BY RUTHERFORD BACK SCATTERING (RBS) AND X-RAY PHOTOELECTRON SPECTROSCOPY (XPS). ATOMIC FORCE MICROSCOPY (AFM) IMAGE AND X-RAY DIFFRACTION (XRD) INDICATED THAT COPPER NANOPARTICLES WERE FORMED IN OUR FILMS.

Cites

No record.

References

No record.

Cite

APA: Copy

GHODS ELAHI, TAYEBEH, VESAGHI, mohamad ali, SHAFIEKHANI, AZIZOLLAH, OLIAIY, PARVIN, & LAMEII RASHTI, MOHAMAD. (2008). EFFECT OF CHAMBER PRESSURE ON THE GROWTH OF NANOPARTICLES COPPERCARBON COMPOSITE FILMS PREPARED BY SIMULTANEOUS USE OF RFPECVD AND RF-SPUTTERING DEPOSITION TECHNIQUE. NATIONAL VACUUM CONFERENCE IRAN. SID. https://sid.ir/paper/905401/en

Vancouver: Copy

GHODS ELAHI TAYEBEH, VESAGHI mohamad ali, SHAFIEKHANI AZIZOLLAH, OLIAIY PARVIN, LAMEII RASHTI MOHAMAD. EFFECT OF CHAMBER PRESSURE ON THE GROWTH OF NANOPARTICLES COPPERCARBON COMPOSITE FILMS PREPARED BY SIMULTANEOUS USE OF RFPECVD AND RF-SPUTTERING DEPOSITION TECHNIQUE. 2008. Available from: https://sid.ir/paper/905401/en

IEEE: Copy

TAYEBEH GHODS ELAHI, mohamad ali VESAGHI, AZIZOLLAH SHAFIEKHANI, PARVIN OLIAIY, and MOHAMAD LAMEII RASHTI, “EFFECT OF CHAMBER PRESSURE ON THE GROWTH OF NANOPARTICLES COPPERCARBON COMPOSITE FILMS PREPARED BY SIMULTANEOUS USE OF RFPECVD AND RF-SPUTTERING DEPOSITION TECHNIQUE,” presented at the NATIONAL VACUUM CONFERENCE IRAN. 2008, [Online]. Available: https://sid.ir/paper/905401/en

Related Journal Papers

No record.

Related Seminar Papers

No record.

Related Plans

No record.

Recommended Workshops