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Information Seminar Paper

Title

NANO-POROSITY IN P-TYPE SILICON BY ELECTROCHEMICAL ETCH

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Abstract

 INTRODUCTION: POROUS SILICON (P-SI) IS A FORM OF THE CHEMICAL ELEMENT SILICON THAT HAS INTRODUCTED NANOPOROUS HOLES IN ITS MICROSTRUCTURE, RENDERING A LARGE SURFACE TO VOLUME RATIO IN THE ORDER OF 500 M2/CM3 [1]. …

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  • Cite

    APA: Copy

    KEIHANI, M., MASOUDI, A., AZIM ARAGHI, M.E., & NADERI, N.. (2014). NANO-POROSITY IN P-TYPE SILICON BY ELECTROCHEMICAL ETCH. IRANIAN PHYSICAL CHEMISTRY CONFERENCE. SID. https://sid.ir/paper/933605/en

    Vancouver: Copy

    KEIHANI M., MASOUDI A., AZIM ARAGHI M.E., NADERI N.. NANO-POROSITY IN P-TYPE SILICON BY ELECTROCHEMICAL ETCH. 2014. Available from: https://sid.ir/paper/933605/en

    IEEE: Copy

    M. KEIHANI, A. MASOUDI, M.E. AZIM ARAGHI, and N. NADERI, “NANO-POROSITY IN P-TYPE SILICON BY ELECTROCHEMICAL ETCH,” presented at the IRANIAN PHYSICAL CHEMISTRY CONFERENCE. 2014, [Online]. Available: https://sid.ir/paper/933605/en

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