Effect of bias voltage on structure, morphology and hardness of ZrN coating deposited by reactive magnetron sputtering

Q: How can I download an article?

To download an article from SID, first log in to the site, search for the article title, and click on the 'Download Article' option.

Q: How can I download an ISI article?

To download an ISI article on SID, enter the keyword or article title in the search bar, view the relevant results, click on the desired article, and select the 'Download Article' option.

Q: How can I access the SID database?

To access the SID database, visit SID.ir, create an account, and log in to access scientific resources.

Q: Is downloading articles from SID free?

Some articles on SID are available for free, while others require payment. Details are specified on the article's page.

Madanypoor Reza; Hasheminiasari Masood; Masoudpanah Seyed Morteza

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Journal Paper

Paper Information

Journal: METALLURGICAL ENGINEERING Year:2018 | Volume:21 | Issue:2 (70) Page(s): 95-101

Download Full-Text

Persian Verion

View:

434

Download:

Cites:

Information Journal Paper

Title

Effect of bias voltage on structure, morphology and hardness of ZrN coating deposited by reactive magnetron sputtering

Author(s)

Madanypoor Reza | Hasheminiasari Masood | Masoudpanah Seyed Morteza | Issue Writer Certificate

Keywords

zirconium nitrideQ2

sputteringQ2

Bias voltageQ1

Abstract

ZrN thin films were deposited on silicon (111) and 304 stainless steel substrates using direct current (DC) reactive magnetron sputtering. The effects of the substrate Bias voltage on the films’ structure, morphology, hardness were investigated. The films were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM) and microhardness tester. XRD patterns showed grain size refinement from 19 to 13 nm with an increase of Bias voltage from 0 V to 150 V. In addition, (111) and (200) diffraction peaks were only present and other orientations were omitted. FESEM cross section of ZrN thin films showed a well aligned columnar structure. The increase of Bias voltage resulted in hardness rise to about 1720 Vickers at Bias voltage of 100 V. Negative Bias voltage induce an increase of the films density by the elimination of the porosity and voids. This maximum hardness can be interpreted by a maximum of the film density and minimum of the porosity

Cites

No record.

References

No record.

Cite

APA: Copy

Madanypoor, Reza, Hasheminiasari, Masood, & Masoudpanah, Seyed Morteza. (2018). Effect of bias voltage on structure, morphology and hardness of ZrN coating deposited by reactive magnetron sputtering. METALLURGICAL ENGINEERING, 21(2 (70) ), 95-101. SID. https://sid.ir/paper/401916/en

Vancouver: Copy

Madanypoor Reza, Hasheminiasari Masood, Masoudpanah Seyed Morteza. Effect of bias voltage on structure, morphology and hardness of ZrN coating deposited by reactive magnetron sputtering. METALLURGICAL ENGINEERING[Internet]. 2018;21(2 (70) ):95-101. Available from: https://sid.ir/paper/401916/en

IEEE: Copy

Reza Madanypoor, Masood Hasheminiasari, and Seyed Morteza Masoudpanah, “Effect of bias voltage on structure, morphology and hardness of ZrN coating deposited by reactive magnetron sputtering,” METALLURGICAL ENGINEERING, vol. 21, no. 2 (70) , pp. 95–101, 2018, [Online]. Available: https://sid.ir/paper/401916/en

Related Journal Papers